Inductively Coupled Plasma Etching System

Inductively Coupled Plasma Etching System

  • Instrument category Micro/Nano Fabrication Center
  • Instrument mode
  • Unit 浙江大学 > Micro & Nano Public Platform
  • Instrument manufacturer
  • Purchase date 2023-01-17
  • Usage patterns Sample presentation reservation,Machine-time reservation
  • Specification SI 500
  • Room number 1E-E107

使用指南

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FAQ

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